InnoPhysics introduces μPlasmaPrint assisted ALD

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KIEM HTSM funding for μPlasmaPrint assisted ALD

Within the pilot KIEM-HTSM, the FOM Foundation has awarded funding to the first two proposals for public-private collaboration projects with SMEs. Prof. Kessels and Dr. Creatore from the Plasma & Materials Processing group at the Eindhoven University of Technology have succesfullly applied for a KIEM HTSM grant entitled Combining micro-plasma printing and atomic layer deposition for patterned ultra-thin film preparation.
In this project

Collaboration InnoPhysics & Eindhoven University of Technology in patterned plasma-assisted Atomic Layer Deposition and announcement new CSO

Eindhoven, the Netherlands – InnoPhysics B.V. and the Plasma & Materials Processing group (PMP) at the department of Applied Physics of the Eindhoven University of Technology (TU/e) are pleased to announce a collaboration in the field of patterned plasma-assisted atomic layer deposition (ALD). This collaboration is financially supported by the recently approved FOM-NWO KIEM-HTSM project “Combining micro-plasma printing and atomic layer deposition for patterned ultra-thin film preparation”, under the supervision of dr. M. Creatore (TU/e).

Workshop Nano Fabrication, Devices & Met …

Eindhoven, the Netherlands

Presentation title: "Towards selective plasma assisted ALD"

InnoPhysics will present their latest developments regarding the succesful introduction of atmospheric pressure µPlasmaPrint assisted Atomic Layer Deposition.

More information see http://visiondynamics.nl/

Abstract

Workshop Nano Bio Surfaces & Interfaces …

Leuven, Belgium

Presentation title: "Towards selective plasma assisted ALD"

InnoPhysics will present their latest developments regarding the succesful introduction of atmospheric pressure µPlasmaPrint assisted Atomic Layer Deposition.

More information see http://visiondynamics.nl/

Abstract

iPlasmaNano

Antwerp, Belgium

Presentation title: "Towards selective plasma assisted ALD"

InnoPhysics will present their latest developments regarding the succesful introduction of atmospheric pressure µPlasmaPrint assisted Atomic Layer Deposition.

More information see http://www.iplasmanano.org/

Abstract